Equipment(设备) | 详情 |
---|---|
ALD | ALDER - 1000 |
Capacity(能力) |
Up to 45 φ300 wafers per batch (≥ 5hour per batch) 每批最多 45 φ300 个晶片(每批 ≥ 5 小时) |
Product Characteristics(产品特性) | 详情 |
Substarte Material(材料) |
Resin - based, glass - based, silicone - based substrate 树脂基、玻璃基、硅基 |
Product Type(产品类型) |
Various types of flat and aspherical mirror coating; wafer coating (within 12"); Shaped structure coating 各类平片、非球面镜镀膜;晶圆镀膜(12“以内);异形结构镀膜 |
Coating material(镀膜材料) | SiO₂, TiO₂, Al₂O₃ |
Optical properties(光学特性) | 详情 |
Wavelength(工作波段) | 420 - 700nm |
Reflectivity(420 - 700nm)(反射(420 - 700nm)) | Rmax<0.1% |
Wide - angle(0°~40°)(大角度(0°~40°)) | Rmax<0.5% |
Appearance(外观规格) | 详情 |
Appearance(外观水平) |
Surface Particle:1.0~10um 表面 Particle:1.0~10um |